Laboratory Equipment

Our laboratory is dedicated to the growth and characterisation of semiconductor materials in view of its use on photonic applications. We can grow II-VI, III-VI and other compounds. Currently our interest is on oxides as ZnO, CdO, MgO, Ga₂O₃, In₂O₃ and their alloys.

We have a wide variety of facilities for crystal growth and sample characterisation. Next you can see a partial instrument list and take a look at some photographs of our laboratory equipment.

Material Preparation and Handling

• Ion Milling Machine, provided with an Ar ion gun
• Cutting Machine, consisting of a diamond wire saw
• Mechanical Polishing Machine, equipped with an integral abrasive auto-feed system
• Ultrasonic disc cutter

Crystal Growth Lab (Lab. -1.23)

• Evaporation System for Thin Film Vacuum Deposition
• Thermal Treatment Oven with Quartz Vessel and Vacuum System
• Vacuum System For Ampoules
• Czochralski Furnace
• THM Furnaces
• Two Zones PVT Horizontal Furnaces
• Four Zones Bridgman Horizontal/Vertical Furnaces 
• Seven Zones Horizontal Furnace

Crystal Growth Lab (Lab. 0.10)

• Two-Inlet Vent-Run Type MOCVD Reactor (Quantax 226 Refurbished by EMF Ltd), Reactor Cell Cabin
• Cooling Baths With Precursor Blubbers
• Control Console
• Rapid Thermal Annealing
• Mass Flow Controlers

Crystal Growth Lab (Lab. 2.51)

• Spray Pyrolysis Growth Systems
• Magnetic Stirrer
• Ultrasonic Cleaning System
• Syringe Pump
• Peristaltic Pump
• Mist-CVD (Chemical Vapor Deposition)

Characterisation Techniques

• X-Ray Diffraction Facilities (Powder and Epitaxial Layers
• SEM and TEM facilities
• Optical analysis (UPM)
• Electrical analysis (UPM)
• Optical modeling (UPM)
• Raman (GEO3BCN)
• Cathodoluminescence (UVA)

Processing Techniques (UPM)

• Crestec Electron Beam Nanolithography (Crestec)
• UV Photolithography
• Inductively Coupled Plasma Etching (ICP)
• Reactive Ion Etching (RIE)
• Metal Deposition
• Ultrasonic and Thermocompression Microsoldering
• Conventional post-growth heat treatment

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