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Laboratory Equipment

Our laboratory is dedicated to the growth and characterisation of semiconductor materials in view of its use on photonic applications. We can grow II-VI, III-VI and other compounds. Currently our interest is on oxides as ZnO, CdO, MgO, Ga2O3, In2O3 and their alloys.

We have a wide variety of facilities for crystal growth and sample characterisation. Next you can see a partial instrument list and take a look at some photographs of our laboratory equipment.


Material Preparation and Handling

Crystal Growth Lab (Lab. -1.23)


Crystal Growth Lab (Lab. 0.10)


Crystal Growth Lab (Lab. 2.51)


Characterisation Techniques

Processing Techniques (UPM)

  • Crestec Electron Beam Nanolithography (Crestec)
  • UV Photolithography
  • Inductively Coupled Plasma Etching (ICP)
  • Reactive Ion Etching (RIE)
  • Metal Deposition
  • Ultrasonic and Thermocompression Microsoldering
  • Conventional post-growth heat treatment


Spray Pirolosis

Reactor MOCVD


Control Panel MOCVD