The ORION NanoFab is an ion microscope designed for the fabrication of nanostructures less than 10 nm using a helium beam. The neon beam allows for an increased the rate of nanostructure formation, thus improving efficiency and performance. The ORION is also capable of acquiring images with a resolution of up to 0.5 nm.

The ORION NanoFab is a He and Ne ion microscope specifically designed for the nanofabrication of structures. It incorporates an Everhart Thornley secondary electron detector and charge compensation via a flow of electrons. Below are the specifications of the equipment:

GFIS Column: 800 µm – 100 nm field of view at an 8 mm WD

Helium ion beam:

• 0.5 nm resolution at 30 kV
• Energy of the beam 10 – 30 kV
• Beam current from 0.1 to 100 pA

Neon ion beam:

• 1.9 nm resolution at 25 kV
• Energy of the beam 10 – 25 kV
• Beam current from 0.1 to 50 pA

Image acquisition system:

• Image size up to 2000×2000 pixels
• Dwell time 100 ns to 100 ms

Sample: Maximum size of 50 mm x 50 mm x 6 mm