The research focuses on growing materials 2D such as graphene, MoS2 o WS2on technologically attractive substrates or reusable in the form of high-quality layers and with homogeneity over large areas, so that they can have a direct application in the electronic industry with sustainable procedures and competitive prices. We will use for this purpose Molecular Beam Epitaxy techniques (MBE) and Plasma Enhanced Chemical Vapor Deposition (PECVD).
The project aims to develop scalable techniques for the incorporation of graphene and other two-dimensional techniques (2D) in microelectronic devices, promoting its transition, from basic research to industrial applications . For this purpose, they propose the controlled growth of graphene and metal dichalcogenide (such as MoS₂) through Molecular Beam Epitaxy (MBE) and Plasma Enhanced Chemical Vapor Deposition (PECVD), evaluating their integration in high-performance transistors, diodes and Hall sensors.
The initiative, by the Institute for Molecular Science (ICMol) in collaboration with Grafenano, aims to optimise low-cost and sustainable 2D semiconductor materials, to establish patents on new synthesis and fabrication methods and create functional prototypes with direct impact on the electronic post-CMOS industry, as well as in power, detection and spintronics technologies.